ASTM E1162-11(2019)

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Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
standard by ASTM International, 11/01/2019

Document Format: PDF

Description

1.1 This practice covers the information needed to describe and report instrumentation, specimen parameters, experimental conditions, and data reduction procedures. SIMS sputter depth profiles can be obtained using a wide variety of primary beam excitation conditions, mass analysis, data acquisition, and processing techniques (1-4).2

Product Details

Published:
11/01/2019
Number of Pages:
3
File Size:
1 file , 110 KB
Note:
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